High-Purity Silicon Carbide (SiC) Powder 99.9999% (6N) HPSI Type 100μm Particle Size SIC Crystal Growth

High-Purity Silicon Carbide (SiC) Powder 99.9999% (6N) HPSI Type 100μm Particle Size SIC Crystal Growth

Silicon carbide powder (SiC), as a core material for third-generation semiconductors, exhibits high thermal conductivity (490 W/m·K), extreme hardness (Mohs 9.5), and wide bandgap (3.2 eV). It is primarily used for SiC crystal growth, power device substrate preparation, and high-temperature ceramic sintering. With ultra-high purity synthesis (≥99.9999%) and precise particle size control (50 nm–200 μm), it meets the requirements of PVT crystal growth furnaces and CVD epitaxial equipment.

Features

· Purity: 6N-grade (99.9999%) metallic impurity control for HPSI-type SiC powder；
· Crystal Form: Controllable 4H/6H polytypes in HPSI SiC powder；
· Particle Size: Adjustable 50 nm–200 μm (D50 distribution ±5%) for high-purity semi-insulating SiC powder；
· Doping: Customizable N-type (nitrogen) or P-type (aluminum) doping in HPSI-grade SiC powder；

Applications

· Crystal Growth: PVT method for 4/6-inch SiC single crystals

· Epitaxial Substrates: Preparation of SiC epitaxial wafers for power devices

· Ceramic Sintering: High-temperature structural components (bearings/nozzles)

ZMSH SIC powder display

ZMSH with expertise in SiC materials and a production facility equipped with PVT crystal growth furnaces, we provide end-to-end solutions from high-purity powders to crystal growth equipment. Our powder purity and particle size consistency lead the industry.